Hydrofluoric Acid HF 49% | Semiconductor Grade | South Korea
Hydrofluoric Acid HF 49% (CAS 7664-39-3) imported from South Korea — SiO2 wafer etching for semiconductor manufacturing. Loc Thien bulk supply, MSDS/COA per batch. Call +84 979 891 929.
Hydrofluoric Acid (HF, CAS 7664-39-3) is a weak but extremely corrosive acid — an essential chemical for SiO₂ (silicon dioxide) etching on semiconductor wafers. In fabs, HF 49% is used to remove native silicon oxide layers, creating an atomically clean surface prior to deposition or doping. Beyond semiconductors, HF is used in glass etching, metal surface pickling, and fluorine chemical synthesis. Loc Thien supplies HF 49% via direct import, with full MSDS/COA, nationwide industrial zone delivery. Call +84 979 891 929 — quote in 15 minutes.
- HF 49% — standard semiconductor industry concentration, CAS 7664-39-3
- Primary use: SiO₂ wafer etching, BOE (with NH₄F), surface cleaning
- Direct import — MSDS, COA per batch
- Packaging: 25L HDPE can, 200L drum, 1000L IBC — KCN delivery
- ⚠️ EXTREMELY HAZARDOUS — penetrates skin to bone, requires specialized PPE and safety SOP
1. Technical Specifications — HF 49%
| Item | Specification |
|---|---|
| Chemical Name | Hydrofluoric Acid |
| Formula | HF |
| CAS Number | 7664-39-3 |
| Concentration | 49% (industrial grade, refer to batch COA) |
| Appearance | Colorless fuming liquid |
| Density | ~1.15 g/mL (49%) |
| Packaging | HDPE can 25L, drum 200L, IBC 1000L |
| Origin | South Korea |
| Documentation | MSDS/SDS, COA per batch |
2. Main Applications
2.1 SiO₂ Etching in Semiconductors
HF is the primary etchant for removing SiO₂ on silicon wafers. Reaction: SiO₂ + 6HF → H₂SiF₆ + 2H₂O. HF 49% combined with NH₄F forms BOE (Buffered Oxide Etch) for stable etch rates — an essential step in IC, MEMS, and sensor manufacturing.
2.2 Metal Surface Pickling
HF removes oxides and scale from stainless steel, titanium, and specialty alloys before welding or coating. Highly effective on complex oxide scales that HCl/H₂SO₄ cannot handle.
2.3 Glass Etching & Fluorine Chemical Synthesis
HF dissolves SiO₂ in glass — used for pattern etching and glass frosting. Also a raw material for cryolite, AlF₃, and other fluorine compounds.
3. ⚠️ Safety Warning — CRITICAL
HF is one of the most dangerous industrial chemicals. Unlike other acids (HCl, H₂SO₄), HF penetrates skin to bone, causing deep tissue necrosis and hypocalcemia that can be fatal. Even minor burns require emergency treatment with calcium gluconate gel.
- Required PPE: Neoprene/Viton gloves, acid-resistant apron, sealed goggles, respirator
- Storage: HDPE or PTFE tanks/containers, separate ventilated area
- Emergency SOP: eyewash station, emergency shower, calcium gluconate gel on-site
- NEVER store in glass — HF dissolves SiO₂
4. HF 49% Quote
HF pricing varies by order volume and delivery location. Contact +84 979 891 929 for a quote within 15 minutes. Loc Thien provides technical consultation, safety SOPs, and full MSDS/COA documentation.
